P. Kearney

Modeling the EUV multilayer deposition process on EUV blanks

Jenah Harris-Jones, V. Jindal, P. Kearney, 2011, Advanced Lithography.

Multilayer defects nucleated by substrate pits: a comparison of actinic inspection and non-actinic inspection techniques

P. Kearney, A. Barty, K. A. Goldberg, 2006, SPIE Photomask Technology.

Ion beam deposition system for depositing low defect density extreme ultraviolet mask blanks

V. Jindal, P. Kearney, R. Teki, 2012, Advanced Lithography.

Inspection and compositional analysis of sub-20 nm EUV mask blank defects by thin film decoration technique

A. Antohe, V. Jindal, P. Kearney, 2013, Advanced Lithography.

Challenges in EUV mask blank deposition for high volume manufacturing

A. Antohe, Frank Goodwin, V. Jindal, 2013, Advanced Lithography.