I. Kato

发表

Fabrication of SiN films at low temperature by RF biased coaxial‐line microwave plasma CVD

Y. Morita, I. Kato, T. Nakajima, 1996 .

Influence of ion bombardment on a‐Si: H films fabricated by plasma chemical vapor deposition

T. Matsushita, I. Kato, Toshiyuki Yoneda, 1995 .

Fabrication of SiN thin films by RF biased microwave plasma CVD

I. Kato, N. Itoh, Kiyotaka Kato, 1991 .

Preparation of silicon nitride films at room temperature using double-tubed coaxial line-type microwave plasma chemical vapor deposition system

I. Kato, Kazuto Noguchi, Kouji Numada, 1987 .

Blue shift of photoluminescence from a-Si: H nanoball films

H. Sakamoto, I. Kato, Y. Kanemoto, 2006 .

Coaxial‐line type microwave plasma CVD system to fabricate SiN films

Y. Kohyama, I. Kato, Kazuto Noguchi, 1986 .

Removal Conditions of Films Deposited on Probe Surface

I. Kato, Tsuyoshi Shimoda Tsuyoshi Shimoda, Toshihiro Yamagishi Toshihiro Yamagishi, 1994 .

Method of Probe Measurement in N2/SiH4 Microwave Plasma

I. Kato, Tsuyoshi Shimoda Tsuyoshi Shimoda, Tadashi Sakamoto Tadashi Sakamoto, 1994 .

Radial distribution of excited atoms in a new coaxial line type microwave cw discharge tube

M. Nagai, H. Tsuchida, I. Kato, 1980 .

Control of radical species in microwave plasma chemical vapor deposition

M. Yamashita, T. Matsushita, I. Kato, 1995 .

Microwave Plasma CVD System for the Fabrication of Thin Solid Films

S. Wakana, S. Hara, I. Kato, 1982 .

Characterization of a-Si:H/SiN multilayer waveguide polarization using an optical pumping application—LED

M. Ab-Rahman, M. Zan, S. M. Mustaza, 2009 .

Microwave Plasma CVD System to Fabricate α-Si Thin Films out of Plasma

S. Wakana, S. Hara, I. Kato, 1983 .

Polymer thin film optical waveguide

Yasushi Matsumoto, Isamu Kato, Masatoshi Komatsu, 1982 .

Stabilization of Ar plasma by applying longitudinal magnetic field

Y. Morita, I. Kato, Toshihiro Yamagishi, 1998 .