Toshiyuki Yoneda

Influence of ion bombardment on a‐Si: H films fabricated by plasma chemical vapor deposition

T. Matsushita, I. Kato, Toshiyuki Yoneda, 1995 .

Control of radical species in microwave plasma chemical vapor deposition

M. Yamashita, T. Matsushita, I. Kato, 1995 .