Samrina Sahir

Tungsten passivation layer (WO3) formation mechanisms during chemical mechanical planarization in the presence of oxidizers

Jin-Goo Park, Nagendra Prasad Yerriboina, Tae-Gon Kim, 2021 .

Investigation of the effect of different cleaning forces on Ce-O-Si bonding during oxide post-CMP cleaning

Jin-Goo Park, S. Han, Nagendra Prasad Yerriboina, 2021 .

Mechanisms of colloidal ceria contamination and cleaning during oxide post CMP cleaning

Jin-Goo Park, S. Han, Nagendra Prasad Yerriboina, 2021 .

Contamination Mechanism of Ceria Particles on the Oxide Surface after the CMP Process

Jin-Goo Park, S. Han, Nagendra Prasad Yerriboina, 2020, ECS Journal of Solid State Science and Technology.

The Adhesion and Removal Mechanism of Ceria Particles for STI Post-CMP Cleaning Process

Jin-Goo Park, S. Han, Nagendra Prasad Yerriboina, 2019, ECS Transactions.