Yeon-Ah Jeong

Nanocatalyst-induced hydroxyl radical (·OH) slurry for tungsten CMP for next-generation semiconductor processing

Jae‐Hyun Kim, Jung-Hwan Lee, Jin-Goo Park, 2019, Journal of Materials Science.

Investigation of particle agglomeration with in-situ generation of oxygen bubble during the tungsten chemical mechanical polishing (CMP) process

Jin-Goo Park, Nagendra Prasad Yerriboina, Jaehyung Kim, 2019, Microelectronic Engineering.