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Intrinsic reoxidation of microwave plasma-nitrided gate dielectrics

R. Khamankar, P. Tiner, A. Varghese, 2005 .

Study of hydrogen stability in low-k dielectric films by ion beam techniques

V. Shutthanandan, S. Thevuthasan, L. Saraf, 2006 .

Advanced CMOS transistors with a novel HfSiON gate dielectric

H. Bu, R. Khamankar, T. Grider, 2002, 2002 Symposium on VLSI Technology. Digest of Technical Papers (Cat. No.01CH37303).

A novel nickel SALICIDE process technology for CMOS devices with sub-40 nm physical gate length

J. Zhao, T. Grider, D. Mercer, 2002, Digest. International Electron Devices Meeting,.