Yijian Chen

发表

THP technology research based on implicit feedback

Feng Zheng, Wanchen Zhao, Yijian Chen, 2013, ICIT 2013.

Mandrel and spacer engineering based self-aligned triple patterning

Qi Cheng, Yijian Chen, Weiling Kang, 2012, Advanced Lithography.

Overlay, decomposition and synthesis methodology for hybrid self-aligned triple and negative-tone double patterning

Yijian Chen, Weiling Kang, 2012, Advanced Lithography.

Statistical modeling of SRAM yield performance and circuit variability

Qi Cheng, Yijian Chen, 2015, Advanced Lithography.

A Classification and Summary of Degradation Process Model

Yijian Chen, Tianxiang Yu, Long Li, 2018 .

Image optimization for maskless lithography

Yijian Chen, William G. Oldham, Yashesh Shroff, 2004, SPIE Advanced Lithography.

Spatial frequency multiplication techniques towards half-pitch 10nm patterning

Ping Xu, Hao Chen, Chris Ngai, 2011, Advanced Lithography.

A frequency multiplication technique based on EUV near-field imaging

Yijian Chen, Yashesh Shroff, 2014, Advanced Lithography.

Mandrel-based patterning: density multiplication techniques for 15nm nodes

Vincent Wiaux, Ping Xu, Huixiong Dai, 2011, Advanced Lithography.

Process characteristics and layout decomposition of self-aligned sextuple patterning

Yijian Chen, Weiling Kang, 2013, Advanced Lithography.

A compact model to predict pillar-edge-roughness effects on 3D vertical nanowire MOSFETs using the perturbation method

Qi Cheng, Yijian Chen, Chuyang Hong, 2015, Advanced Lithography.

Sidewall spacer quadruple patterning for 15nm half-pitch

Ping Xu, Chris Ngai, Yijian Chen, 2011, Advanced Lithography.

Analysis of process characteristics of self-aligned multiple patterning

Yijian Chen, Weiling Kang, Qi Cheng, 2012 .

Process development and edge-placement yield modeling of alternating-material self-aligned multiple patterning

Yijian Chen, Ting Han, Hongyi Liu, 2016 .

A generalized model to predict fin-width roughness induced FinFET device variability using the boundary perturbation method

Qi Cheng, Yijian Chen, Jun You, 2014, Advanced Lithography.

Impacts of process variability of alternating-material self-aligned multiple patterning on SRAM circuit performance

Qi Cheng, Yijian Chen, Ting Han, 2016, SPIE Advanced Lithography.

Optical analysis of mirror-based pattern generation

Yijian Chen, William G. Oldham, Yashesh Shroff, 2003, SPIE Advanced Lithography.

Technological merits, process complexity, and cost analysis of self-aligned multiple patterning

Qi Cheng, Yijian Chen, Weiling Kang, 2012, Advanced Lithography.

A comparative study of self-aligned quadruple and sextuple patterning techniques for sub-15nm IC scaling

Pan Zhang, Yijian Chen, Weiling Kang, 2013, Advanced Lithography.

Recessive self-aligned double patterning with gap-fill technology

Hao Chen, Chris Ngai, Yijian Chen, 2011, Advanced Lithography.

Design and fabrication of tilting and piston micromirrors for maskless lithography

Yijian Chen, William G. Oldham, Yashesh Shroff, 2005, SPIE Advanced Lithography.

A generalized edge-placement yield model for the cut-hole patterning process

Yijian Chen, Pan Zhang, Chuyang Hong, 2014, Advanced Lithography.

Self-aligned triple patterning for continuous IC scaling to half-pitch 15nm

Ping Xu, Chris Ngai, Yijian Chen, 2011, Advanced Lithography.

A paradigm shift in patterning foundation from frequency multiplication to edge-placement accuracy: a novel processing solution by selective etching and alternating-material self-aligned multiple patterning

Yijian Chen, Ting Han, Hongyi Liu, 2016, SPIE Advanced Lithography.

Microwave propagation in air drilling

Xiaofeng Meng, Yijian Chen, Jing Zhou, 2010 .

Control and shape design of an electrically damped comb drive for digital switches

Yijian Chen, 2000, SPIE MOEMS-MEMS.

Understanding the critical challenges of self-aligned octuple patterning

Wei Xiao, Yijian Chen, Ji Yu, 2014, Advanced Lithography.

A comparative study on the yield performance of via landing and direct stitching processes for 2D pattern connection

Jun Zhou, Yijian Chen, 2016, SPIE Advanced Lithography.

Cut-process overlay yield model for self-aligned multiple patterning and a misalignment correction technique based on dry etching

Yijian Chen, Pan Zhang, 2013, Advanced Lithography.

Compact modeling of fin-width roughness induced FinFET device variability using the perturbation method

Qi Cheng, Yijian Chen, Weiling Kang, 2013, Advanced Lithography.

Sub-20 nm trench patterning with a hybrid chemical shrink and SAFIER process

Hao Chen, Yijian Chen, Man-Ping Cai, 2009, Advanced Lithography.

Intra-cell process variability and compact modeling of LWR effects: from self-aligned multiple patterning to multiple-gate MOSFETs

Qi Cheng, Yijian Chen, Weiling Kang, 2012, Advanced Lithography.

SRAM circuit performance in the presence of process variability of self-aligned multiple patterning

Qi Cheng, Wei Xiao, Yijian Chen, 2013, Advanced Lithography.