Teddie Magbitang

Fundamentals of EUV resist-inorganic hardmask interactions

Anuja De Silva, Dario L. Goldfarb, Nelson M. Felix, 2017, Advanced Lithography.

High chi block copolymer DSA to improve pattern quality for FinFET device fabrication

Chi-Chun Liu, C. Grant Willson, Christopher J. Ellison, 2016, SPIE Advanced Lithography.

Toward Successful Integration of Porous Low-k Materials: Strategies Addressing Plasma Damage

Krystelle Lionti, Teddie Magbitang, Maxime Darnon, 2015 .

Impact of curing kinetics and materials properties on imprint characteristics of resists for UV nano-imprint lithography

Martha I. Sanchez, Frances A. Houle, Robert D. Allen, 2007, SPIE Advanced Lithography.

Synthesis and Characterization of Polycarbonate-containing All-organic High-χ Block Copolymers for Directed Self-assembly

Joy Cheng, Daniel P. Sanders, Teddie Magbitang, 2015 .