C. Crider

Platinum silicide formation under ultrahigh vacuum and controlled impurity ambients

J. E. Rowe, T. T. Sheng, J. Poate, 1981 .

UHV facility for metal–semiconductor thin‐film studies

J. Poate, J. Rowe, C. Crider, 1978 .

A UHV chamber for metal-semiconductor and metal-metal thin film studies

J. Poate, J. Rowe, G. H. Wheatley, 1978 .

Growth rates for Pt2Si and PtSi formation under UHV and controlled impurity atmospheres

J. Poate, C. Crider, 1980 .

Ultrahigh vacuum multipurpose offset manipulator for surface and thin film reaction studies

C. Crider, 1981 .

First results from a 6 m/10 m toroidal grating monochromator for soft x-rays

A. Marx, F. Himpsel, D. Eastman, 1984 .