Hiral M. Ajmera

Deposition of WN x C y Using the Allylimido Complexes Cl4 ( RCN ) W ( NC3H5 ) : Effect of NH3 on Film Properties

D. Norton, T. Anderson, L. McElwee‐White, 2008 .

Deposition of WNxCy from the Tungsten Piperidylhydrazido Complex Cl4(CH3CN)W(N-pip) as a Single-source Precursor

Oh Hyun Kim, K. Abboud, L. McElwee‐White, 2009, ECS Transactions.

Deposition of WNxCy for diffusion barrier application using the imido guanidinato complex W(NiPr)Cl3[PriNC(NMe2)NiPr]

D. Norton, T. Anderson, L. McElwee‐White, 2008 .

Properties of Ta–Ge–(O)N as a diffusion barrier for Cu on Si

D. Norton, T. Anderson, L. McElwee‐White, 2007 .

Deposition of WNxCy thin films for diffusion barrier application using the dimethylhydrazido (2 − ) tungsten complex (CH3CN)Cl4W(NNMe2)

D. Norton, L. McElwee‐White, T. Anderson, 2009 .

Synthesis and characterization of diorganohydrazido(2-) tungsten complexes.

K. Abboud, L. McElwee‐White, T. Anderson, 2008, Inorganic Chemistry.