Kazushi Osari

Etching of High-k Dielectric HfO2 Films in BCl3-Containing Plasmas Enhanced with O2 Addition

Kazuo Takahashi, K. Ono, Keisuke Nakamura, 2006 .

Plasma etching of high-k and metal gate materials

Kouichi Ono, Kazuo Takahashi, K. Ono, 2006 .