I. Fisher

Dielectric property-microstructure relationship for nanoporous silica based thin films

W. Kaplan, M. Eizenberg, I. Fisher, 2004 .

Study of Porous Silica Based Films as Low-k Dielectric Material and their Interface with Copper Metallization

Michael P. Nault, W. Kaplan, M. Eizenberg, 2002 .

Work function tuning of plasma-enhanced atomic layer deposited WCxNy electrodes for metal/oxide/semiconductor devices

Tom Mountsier, Oren Zonensain, Moshe Eizenberg, 2015 .

Explosive Detection by Microthermal Analysis

S. Meltzer, A. Zuck, G. Frishman, 2008 .

Copper ion diffusion in porous and nonporous SiO2-based dielectrics using bias thermal stress and thermal stress tests

Moshe Eizenberg, M. Eizenberg, Ilanit Fisher, 2008 .

Thermal stability of atomic layer deposited WCxNy electrodes for metal oxide semiconductor devices

Ju Gao, M. Eizenberg, M. Daněk, 2018 .