C. Yoo

Etching characteristics of photoresist and low-k dielectrics by Ar/O2 ferrite-core inductively coupled plasmas

C. Chung, Young‐Chang Joo, Hyoun-woo Kim, 2008 .

Study of ashing for low-k dielectrics using the N2/O2 ferrite-core inductively coupled plasmas

C. Chung, Hyoun-woo Kim, H. Lee, 2006 .

Photoresist ashing in nitrogen gas using ferrite core inductively coupled plasmas

C. Chung, Hyoun-woo Kim, W. Park, 2005 .

Application of N2/Ar inductively coupled plasma → the photoresist ashing for low-k dielectrics

Jaegab Lee, C. Chung, Hyoun-woo Kim, 2005 .