C. Liu

Using E‐Beam and X‐Ray Lithography Techniques to Fabricate Zone Plates for Hard X‐ray

I. Lin, J. Je, G. Margaritondo, 2007 .

E-beam lithography and electrodeposition fabrication of thick nanostructured devices

I. Lin, J. Je, G. Margaritondo, 2007 .

Hard x-ray microscopy with Fresnel zone plates reaches 40 nm Rayleigh resolution.

Q. Shen, F. Carlo, Y. Chu, 2008 .

Fabrication of 200 nm period centimeter area hard x-ray absorption gratings by multilayer deposition

Lahsen Assoufid, F. De Carlo, Eric E. Bennett, 2012 .