Kwang Su Yoo

P‐2: Nitrogen Behaviors in PEALD‐Grown SiO 2 Films Using N 2 O Plasma Reactant and Its Application in ALD‐IZO TFTs

Dong-Gyu Kim, Hye-mi Kim, Jinsin Park, 2022, SID Symposium Digest of Technical Papers.

Impact of N2O Plasma Reactant on PEALD-SiO2 Insulator for Remarkably Reliable ALD-Oxide Semiconductor TFTs

Dong-Gyu Kim, Hye-mi Kim, Jinsin Park, 2022, IEEE Transactions on Electron Devices.

Atmospheric pressure spatial ALD of Al2O3 thin films for flexible PEALD IGZO TFT application

Dong-Gyu Kim, Won-Bum Lee, Jinsin Park, 2022, Ceramics International.