M. George

Hydrogen content of silicon and thermal oxidation induced moisture generation in an integrated rapid thermal processing reactor

J. Wortman, D. Bohling, G. Hames, 1993 .

Effects of microcontaminants in oxygen during gate oxide growth: interfacial effects and device reliability

W. Lanford, J. Wortman, J. McGuire, 1994, Proceedings of 1994 IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop (ASMC).

Deposition, annealing and characterisation of high‐dielectric‐constant metal oxide films

A. Lane, G. Tempel, W. Kern, 1995 .

The Effects of Chemical Vapor Cleaning Chemistries on Silicon Surfaces

J. Langan, A. G. Gilicinski, R. Rynders, 1993 .

Reaction of 1,1,1,5,5,5‐Hexafluoro‐2,4‐pentanedione (H+hfac) with CuO , Cu2 O , and Cu Films

A. Lane, D. Hess, S. E. Beck, 1995 .

Chemical Vapor Cleaning of Sodium from SiO 2

B. S. Felker, D. Bohling, M. George, 1992 .

Investigation of the Hydrogen Content of Silicon in an Integrated Rapid Thermal Processing Reactor

J. Wortman, S. E. Beck, D. Bohling, 1992 .

Examining process induced contamination: plasma etching and chemical vapor deposition reactors coupled to an in situ surface analytical capability

J. Langan, D. Bohling, M. George, 1992, IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop - ASMC '92 Proceedings.

Materials selection for HBr service

J. Langan, M. George, W. Bailey, 1995 .