T. Kezuka

Metallic Impurities Segregation at the Interface Between Si Wafer and Liquid during Wet Cleaning

T. Ohmi, T. Imaoka, I. Sugiyama, 1992 .

Segregation and removal of metallic impurity at interface of silicon and fluorine etchant

T. Ohmi, T. Imaoka, J. Takano, 1993 .

Preparation and properties of nanocrystalline ZnS : Mn-polymer composite films

M. Senna, T. Isobe, T. Kezuka, 2000 .

Particle Adhesion and Removal on Wafer Surfaces in RCA Cleaning

M. Itano, T. Kezuka, 1998 .

Minimization of Particle Contamination during Wet Processing of Si Wafers

Tadahiro Ohmi, M. Ishii, T. Ohmi, 1995 .