R. Sonnemans

Lossless Solvent-based Extension Implant Strip

G. Mannaert, D. Tsvetanova, T. Conard, 2009 .

Non-Oxidizing Solvent-Based Strip of Ion Implanted Photoresist

D. Tsvetanova, M. Heyns, R. Vos, 2012 .

Removal of High-Dose Ion-Implanted 248 nm Deep UV Photoresist Using UV Irradiation and Organic Solvent

D. Tsvetanova, M. Heyns, R. Vos, 2011 .

Metrology for Implanted Si Substrate and Dopant Loss Studies

G. Mannaert, E. Rosseel, H. Bender, 2009 .

Effects of resist strip and clean on USJ performance

M. Ameen, I. Berry, S. Luo, 2008, Extended Abstracts - 2008 8th International Workshop on Junction Technology (IWJT '08).

Post Extension Ion Implant Photo Resist Strip for 32 nm Technology and beyond

G. Mannaert, D. Shamiryan, I. Berry, 2009 .