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Diffusion phenomena at the interface between dielectric films and compound semiconductors

H. Sasaki, S. Abe, H. Kurokawa, 2005 .

Dielectric Properties of (BaxSr1-x)TiO3 Thin Films Prepared by RF Sputtering for Dynamic Random Access Memory Application

Tsuyoshi Horikawa, Noboru Mikami, Tetsuro Makita, 1994 .

Characteristics of 4H–SiC MOS interface annealed in N2O

M. Imaizumi, K. Fujihira, Y. Tarui, 2005 .