L. Ehouarne

In situ study of the growth kinetics and interfacial roughness during the first stages of nickel-silicide formation

F. Nemouchi, D. Mangelinck, E. Ziegler, 2006 .

First silicide formed by reaction of Ni(13%Pt) films with Si(100): Nature and kinetics by in-situ X-ray reflectivity and diffraction

D. Mangelinck, E. Ziegler, M. Putero, 2010 .

Dopant Effect On NiGe Texture During Nickel Germanide Growth

O. Kermarrec, Y. Campidelli, F. Nemouchi, 2007 .

Tomography of self‐potential anomalies of electrochemical nature

A. Revil, L. Ehouarne, E. Thyreault, 2001 .