M. Diekema

Borderless nitride requirements for embedded non-volatile deep sub-micron technologies

A. Cacciato, A. Scarpa, M. Diekema, 2003, ESSDERC '03. 33rd Conference on European Solid-State Device Research, 2003..

Charging damage during contact etch triggered by increased borderless nitride conductivity

A. Scarpa, S. Evseev, M. Diekema, 2003, 2003 8th International Symposium Plasma- and Process-Induced Damage..

Low-Voltage Embedded Flash-EEPROM in 0.18 μm CMOS

Guoqiao Tao, Antonio Cacciato, R. Verhaar, 2001 .

Effect of charge transport through silicon nitride on thin gate oxide reliability

A. Scarpa, A. Cacciato, A. Cacciato, 2002 .