Kyungkyu Min

Crystallized HfLaO embedded tetragonal ZrO2 for dynamic random access memory capacitor dielectrics

Seok-Hee Lee, B. Cho, Kee-jeung Lee, 2011 .

Overcoming the reliability limitation in the ultimately scaled DRAM using silicon migration technique by hydrogen annealing

Sungjoo Hong, Seong-Wan Ryu, T. Jang, 2017, 2017 IEEE International Electron Devices Meeting (IEDM).