Kunihide Tachibana Kunihide Tachibana

Direct Photochemical Vapor Deposition of Hydrogenated Amorphous Silicon -Effects of Excitation Wavelengths and Source Gases-

T. Shirafuji, S. Nakajima, Y. Wang, 1993 .

In Situ Measurement of Gas-Phase Reactions in Metal-Organic Chemical Vapor Deposition of Copper Films by Fourier Transform Infrared Spectroscopy

H. Ohnishi, Ken–ichi Hanaoka, Kunihide Tachibana Kunihide Tachibana, 1993 .

Monte-Carlo Simulation of Surface Reactions in Plasma-Enhanced Chemical Vapor Deposition of Hydrogenated Amorphous Silicon Thin Films

T. Shirafuji, Wei-ming Chen, Kunihide Tachibana Kunihide Tachibana, 1993 .

Electron Attachment Mass Spectrometry for the Detection of Electronegative Species in a Plasma

W. Stoffels, Kunihide Tachibana Kunihide Tachibana, Eva Stoffels Eva Stoffels, 1997 .