Christian Preischl
发表
SiO2 etching and surface evolution using combined exposure to CF4/O2 remote plasma and electron beam
D. Rhinow,
G. Oehrlein,
K. Edinger,
2022,
Journal of Vacuum Science & Technology A.
D. Rhinow,
G. Oehrlein,
K. Edinger,
2023,
Journal of Vacuum Science & Technology A.
C. Wöll,
H. Gliemann,
Luisa Berger,
2018,
ACS nano.
P. Swiderek,
H. Marbach,
Christian Preischl,
2018,
The Journal of Physical Chemistry C.
H. Steinrück,
L. McElwee‐White,
H. Marbach,
2022,
ACS Applied Nano Materials.
A. Gölzhäuser,
H. Marbach,
Linh Hoang Le,
2021,
Beilstein journal of nanotechnology.