Donghwan Kim

发表

Effect of different frequency combination on ArF photoresist deformation and silicon dioxide etching in the dual frequency superimposed capacitively coupled plasmas

G. Kwon, Namseok Lee, C. Lee, 2006 .

Effect of high-frequency variation on the etch characteristics of ArF photoresist and silicon nitride layers in dual frequency superimposed capacitively coupled plasma

C. H. Lee, N. Lee, G. Kwon, 2005 .