Lin Hu

Design technology co-optimization assessment for directed self-assembly-based lithography: design for directed self-assembly or directed self-assembly for design?

Nelson Felix, Markus Brink, Chi-Chun Liu, 2017 .

Lithographic qualification of high-transmission mask blank for 10nm node and beyond

Nelson Felix, Richard Wistrom, Yoshifumi Sakamoto, 2016, Advanced Lithography.

Multi-layer VEB modeling: capturing interlayer etch process effects for multi-patterning process

John L. Sturtevant, Young Ki Kim, Sunwook Jung, 2016, Advanced Lithography.

Electric loading system with multi closed-loop control

Lin Hu, 2015 .

Leveraging data analytics, patterning simulations and metrology models to enhance CD metrology accuracy for advanced IC nodes

Todd C. Bailey, Yunlin Zhang, Narender Rana, 2014, Advanced Lithography.

Study of the Vehicle Controllability and Stability Based on Multi-body System Dynamics

Jia Yang, Lin Hu, Shengyong Fang, 2014 .