Ted A. Paxton

DualBeam metrology: a new technique for optimizing 0.13-um photo processes

Steven D. Berger, Denis Desloge, Robert J. Virgalla, 2001, SPIE Advanced Lithography.

Impact of surfactant in developer on CD performance

Peng Zhang, Zarka Zarkov, Todd Davis, 2003, SPIE Advanced Lithography.

Pattern collapse and line width roughness reduction by surface conditioner solutions for 248-nm lithography

Peng Zhang, Pat Cook, Todd Davis, 2005, SPIE Advanced Lithography.

Impact of surfactant in developer and rinse solution on 193-nm lithography performance

Peng Zhang, Todd Davis, Ted A. Paxton, 2003, SPIE Advanced Lithography.