Wolfgang Dettmann

Image performance and mask characterization of 157-nm alternating phase-shifting mask

Wolfgang Degel, Roderick Koehle, Jeff Meute, 2003, SPIE Advanced Lithography.

AltPSM Inspection Capability and Printability of Quartz Defects

Larry S. Zurbrick, Jan Heumann, Michael Lang, 2002, Photomask Technology.

Defect printability study with programmed defects on halftone reticles

Jan Heumann, Wolfgang Dettmann, Henning Haffner, 2001, Photomask Japan.

Introduction of full-level alternating phase-shift mask technology into IC manufacturing

Rainer Pforr, Marco Ahrens, Burkhard Ludwig, 2002, SPIE Advanced Lithography.

Balancing of alternating phase-shifting masks for practical application: modeling and experimental verification

Leonhard Mader, Rainer Pforr, Armin Semmler, 2001, SPIE Photomask Technology.

Defect inspection of quartz-PSMs: taking a leap forward

Larry S. Zurbrick, Michael Lang, Jan Heumann, 2004, SPIE Advanced Lithography.

Contact layer printing using alternating phase-shifting masks: mask making, patterning results, and production implementation

Detlef Hofmann, Rainer Pforr, Mario Hennig, 2004, European Mask and Lithography Conference.