Hideaki Hasegawa

Fabrication process of alternating phase-shift mask for practical use

Satoru Asai, Naoyuki Ishiwata, Takema Kobayashi, 2000, Photomask Japan.

Requirements of attenuated PSM for 0.18-μm gate patterns

Satoru Asai, Naoyuki Ishiwata, Hideaki Hasegawa, 1998, Photomask and Next Generation Lithography Mask Technology.

Design and fabrication of semiconductor optical amplifier with low noise figure

Masaki Funabashi, Hideaki Hasegawa, Noriyuki Yokouchi, 2010, OECC 2010 Technical Digest.

Semiconductor Optical Amplifiers with Low Noise Figure

Masaki Funabashi, Hideaki Hasegawa, Noriyuki Yokouchi, .

Hybrid integration of semiconductor optical amplifier and silica-based planar lightwave circuit for low polarization dependent gain

Masaki Funabashi, Hideaki Hasegawa, Noriyuki Yokouchi, 2011, 2011 Optical Fiber Communication Conference and Exposition and the National Fiber Optic Engineers Conference.