Alan R. Stivers

Alt-PSM for 0.10um and 0.13um poly patterning

Richard Schenker, Edita Tejnil, Heinrich Kirchauer, 2000 .

Magnetron reactive sputtering of TaN and TaON films for EUV mask applications

Malahat Tavassoli, Alan R. Stivers, Kyung M. Lee, 2005, SPIE Photomask Technology.

EUV substrate and blank inspection with confocal microscopy

Ted Liang, Jan-Peter Urbach, Alan R. Stivers, 2003, SPIE Photomask Technology.

Comparison of techniques to measure the point spread function due to scatter and flare in EUV lithography systems

Bryan J. Rice, Michael Goldstein, Guojing Zhang, 2004, SPIE Advanced Lithography.

Modeling the defect inspection sensitivity of a confocal microscope

Kuen-Yu Tsai, Eric M. Gullikson, Edita Tejnil, 2005, SPIE Advanced Lithography.

Evaluation of the Capability of a Multibeam Confocal Inspection System for Inspection of EUVL Mask Blanks

Moonsuk Yi, Paul B. Mirkarimi, Cindy C. Larson, 2002, Photomask Technology.

Options for at-wavelength inspection of patterned extreme ultraviolet lithography masks

Edita Tejnil, Alan R. Stivers, 1999, Photomask Technology.

Dependence of mask-defect printability and printability criteria on lithography process resolution

Edita Tejnil, Alan R. Stivers, 2002, SPIE Photomask Technology.