James H. Bennewitz

0.25 μm Periodic Structures For Lightwave Technology Fabricated By Spatial Frequency Doubling Lithography (SFDL)

Tanya E. Jewell, Victor Pol, James H. Bennewitz, 1989, Advanced Lithography.

Effect Of Laser Characteristics On The Performance Of A Deep UV Projection System

Tanya E. Jewell, Victor Pol, James H. Bennewitz, 1987, Advanced Lithography.

Excimer Laser-Based Lithography: A Deep Ultraviolet Wafer Stepper

Tanya E. Jewell, Victor Pol, Martin Feldman, 1986, Advanced Lithography.

Excimer laser based lithography: a deep-ultraviolet wafer stepper for VLSI processing

Tanya E. Jewell, Victor Pol, Darryl W. Peters, 1987 .