Y. Li

发表

Plasma etching of polysilicon/nitride/polysilicon sandwich structure for sensor applications

R. Wolffenbuttel, P. Sarro, P. French, 1993 .

An anisotropic U-shaped SF6-based plasma silicon trench etching investigation

C. Beenakker, H. W. Zeijl, A. Burtsev, 1998 .

Reactive ion etching (RIE) techniques for micromachining applications

M. R. Wolffenbuttel, R. Wolffenbuttel, P. Sarro, 1994 .

Plasma planarization for sensor applications

Reinoud F. Wolffenbuttel, Patrick J. French, R. Wolffenbuttel, 1995 .

Process design for plasma etching of polysilicon/silicon nitride/polysilicon sandwich structures for sensor applications

Pasqualina M. Sarro, Reinoud F. Wolffenbuttel, P. J. French, 1993 .

SIMPLE — A technique of silicon micromachining using plasma etching

R. Wolffenbuttel, P. Sarro, P. French, 1996 .

Selective reactive ion etching of silicon nitride over silicon using CHF3 with N2 addition

P. J. French, R. F. Wolffenbuttel, R. Wolffenbuttel, 1995 .

Stress Isolation Used In MEMS Resonant Pressure Sensor Package

Junbo Wang, Deyong Chen, Yuxin Li, 2011 .