K. Miyoshi

发表

Detection of surface impurities on Si wafers using total reflection x-ray photoelectron spectroscopy

Y. Iijima, K. Miyoshi, S. Saito, 1999 .

Defect control of STI process technology : Special issue on advanced semiconductor processing technology

K. Okonogi, K. Miyoshi, Akio Today, 2001 .

Recent advances in the application of total reflection x‐ray photoelectron spectroscopy in the semiconductor industry

Y. Iijima, K. Miyoshi, 1999 .

Ultra-Trace-Element Analysis Used with Total-Renection X-ray Photoelectron Spectroscopy.

Y. Iijima, K. Miyoshi, 2000 .