Y. Sasaki

Pellicle factors affecting finished photomask flatness

Kenneth C. Racette, Andrew J. Watts, Monica Barrett, 2007, Photomask Japan.

Process integration of single-wafer technology in a 300-mm fab, realizing drastic cycle time reduction with high yield and excellent reliability

Y. Sasaki, Michimasa Funabashi, K. Nemoto, 2003 .