M. Shin

Etching characteristics of ZnO thin films in chlorine-containing inductively coupled plasmas

N. Lee, J. Boo, J. G. Han, 2006 .

Experimental and Finite Element Study of Tribological Characteristics of SU-8 Thin Film

I. Sung, M. Shin, Sang-Kuk Han, 2013 .

Investigation of process window during dry etching of ZnO thin films by CH4–H2–Ar inductively coupled plasma

Nae-Eung Lee, N. Lee, J. G. Han, 2005 .

Dry Etching of TaN/HfO2 Gate Stack Structure by Cl2/SF6/Ar Inductively Coupled Plasma

N. Lee, Jiyoung Kim, J. Ahn, 2005 .