R. Fehlmann

The post-hydrogenation of low-pressure chemical vapor deposited amorphous silicon

C. Magee, A. Widmer, R. Fehlmann, 1983 .

The growth and physical properties of low pressure chemically vapour-deposited films of tantalum silicide on n+-type polycrystalline silicon

A. Widmer, R. Fehlmann, 1986 .

The diffusion of zinc in gallium phosphide under excess phosphorus pressure from a ZnP2 source

A. Widmer, R. Fehlmann, 1971 .

A millivolt source for temperature programming of laboratory furnaces

A. Widmer, R. Fehlmann, 1974 .

Liquid-phase epitaxial growth of multiple (AlGa) P-GaP hetero-junction structures

H. P. Kleinknecht, A. Widmer, R. Fehlmann, 1976 .