Ernesto Gallardo

Effect of real masks on wafer patterning

Christopher A. Spence, Ramkumar Subramanian, David Teng, 2000, Advanced Lithography.

Deep-UV reflection control for patterning dielectric layers

Bhanwar Singh, Ramkumar Subramanian, Christopher F. Lyons, 1998, Advanced Lithography.

Process control and optimization of conventional metal process for 0.18-micron logic technology

Stuart E. Brown, Bhanwar Singh, Ramkumar Subramanian, 2000, Advanced Lithography.

Extending the limits of i-line lithography for via layers and minimization of dense-iso bias

Christopher A. Spence, Thomas Werner, Ramkumar Subramanian, 1999, Advanced Lithography.