Francis Boydens

Reactive sputter deposition of Al doped TiOx thin films using titanium targets with aluminium inserts

D. Depla, D. Poelman, Bert Braeckman, 2013 .

High entropy alloy thin films deposited by magnetron sputtering of powder targets

D. Depla, P. Dutheil, A. Thomann, 2015 .

On the target surface cleanness during magnetron sputtering

R. Schelfhout, K. Strijckmans, D. Depla, 2015 .

Influence of the magnetic field configuration on the reactive sputter deposition of TiN

D. Depla, S. Mahieu, J. Haemers, 2010 .

Deposition of thin films by sputtering cold isostatically pressed powder targets: A case study

D. Depla, W. Leroy, R. Persoons, 2012 .

The influence of target surface morphology on the deposition flux during direct-current magnetron sputtering

D. Depla, W. Leroy, R. Persoons, 2013 .