Chih-i Wei

Calibration of Gaussian random field stochastic EUV models

Gurdaman S. Khaira, P. de Bisschop, G. Fenger, 2022, Advanced Lithography.

Importance sampling in Gaussian random field EUV stochastic model for quantification of stochastic variability of EUV vias

P. de Bisschop, J. Sturtevant, G. Fenger, 2023, Advanced Lithography.

Compact modeling of stochastics and application in OPC

J. Sturtevant, G. Fenger, A. Latypov, 2023, Advanced Lithography.