Jung-Hyoung Lee

Mass production worthy HfO/sub 2/-Al/sub 2/O/sub 3/ laminate capacitor technology using Hf liquid precursor for sub-100 nm DRAMs

Ho-Kyu Kang, Jong-Ho Lee, T. Seidel, 2002, Digest. International Electron Devices Meeting,.

Practical next generation solution for stand-alone and embedded DRAM capacitor

Ho-Kyu Kang, Jong-Ho Lee, N. Lee, 2002, 2002 Symposium on VLSI Technology. Digest of Technical Papers (Cat. No.01CH37303).