Y. Kim

Radical flux control in reactive ion beam etching (RIBE) by dual exhaust system

G. Yeom, Y. Ji, D. Kim, 2022, Applied Surface Science.

Etch characteristics of magnetic tunnel junction materials using H2/NH3 reactive ion beam

G. Yeom, Jea‐Gun Park, Hanna Cho, 2020, Nanotechnology.

Cyclic etching of silicon oxide using NF 3 /H 2 remote plasma and NH 3 gas flow

G. Yeom, K. Kim, D. Kim, 2021, Plasma Processes and Polymers.

Etch characteristics of Si and TiO2 nanostructures using pulse biased inductively coupled plasmas

G. Yeom, K. Kim, Dongwoo Kim, 2020, Nanotechnology.

Anisotropic/Isotropic Atomic Layer Etching of Metals

G. Yeom, K. Kim, D. Kim, 2020, Applied Science and Convergence Technology.