Grainne Duffy

High-performance next-generation EUV lithography light source

Peter Choi, Sergey V. Zakharov, Raul Aliaga-Rossel, 2009, Advanced Lithography.

High brightness EUV light sources for actinic metrology

Peter Choi, Keith Powell, Sergey V. Zakharov, 2010, Advanced Lithography.

Optimizing an EUV source for 13.5 nm

Luke McKinney, Anthony Cummings, Nicola Murphy, 2004, SPIE Optics + Photonics.

Investigation of EUV sources for 13.5-nm operation

Padraig Dunne, Anthony Cummings, Grainne Duffy, 2003, SPIE OPTO-Ireland.

High-brightness EUV light source for HVM

Peter Choi, Keith Powell, Sergey V. Zakharov, 2011, Advanced Lithography.