Ki Yeop Park

Integration using inorganic BARC in a via-first dual-damascene process with low-k dielectric

Jae Sung Choi, Jeong Gun Lee, Young Keun Kim, 2004, SPIE Advanced Lithography.

The Print Bias due to the Optical Proximity Effect and Process Optimization for 0.25mm Logic Devices

Won Gyu Lee, Byoung-Il Choi, Ki Yeop Park, 1997 .