Kunihiro Ugajin

Reduction of resist charging effect by EB reticle writer EBM-7000

Osamu Ikenaga, Masato Saito, Kunihiro Ugajin, 2009, Photomask Japan.

Potential of mask production process for finer pattern fabrication

Masamitsu Itoh, Kazuki Hagihara, Yoshihito Kobayashi, 2013, Photomask Technology.

High performance photomask technology with the advanced binary film

Osamu Ikenaga, Hidehiro Watanabe, Kosuke Takai, 2010, Photomask Technology.

Higher current density operation with EB reticle writer EBM-5000

Hidehiro Watanabe, Masato Saito, Kunihiro Ugajin, 2006, Photomask Japan.

High performance mask fabrication process for the next-generation mask production

Masamitsu Itoh, Kazuki Hagihara, Yoshihito Kobayashi, 2014, Photomask and Next Generation Lithography Mask Technology.

1-nm of local CD accuracy for 45-nm-node photomask with low sensitivity CAR for e-beam writer

Osamu Ikenaga, Hidehiro Watanabe, Machiko Suenaga, 2007, Photomask Japan.

Improvement of sub-20nm pattern quality with dose modulation technique for NIL template production

Kazuki Hagihara, Masamitsu Ito, Sachiko Kobayashi, 2016, SPIE Advanced Lithography.

The Performances and Challenges of Today’s EB Lithography and EB-resist Materials

Yoshihito Kobayashi, Machiko Suenaga, Kunihiro Ugajin, 2014 .