V. Bellas

Evaluation of siloxane and polyhedral silsesquioxane copolymers for 157 nm lithography

E. Gogolides, E. Tegou, N. Hadjichristidis, 2002 .

Polyhedral oligomeric silsesquioxane (POSS) acrylate copolymers for microfabrication: properties and formulation of resist materials

E. Gogolides, E. Tegou, P. Argitis, 2004 .

Polyhedral Oligomeric Silsesquioxane (POSS) Based Resists: Material Design Challenges and Lithographic Evaluation at 157 nm

C. Cardinaud, E. Gogolides, E. Tegou, 2004 .

Surface modification of polyhedral oligomeric silsesquioxane block copolymer films by 157 nm laser light

S. Kobe, Z. Kollia, A. Cefalas, 2009 .

Surface segregation of photoresist copolymers containing polyhedral oligomeric silsesquioxanes studied by x-ray photoelectron spectroscopya)

C. Cardinaud, E. Gogolides, E. Tegou, 2004 .