Lisong Dong

发表

Development defect model for immersion photolithography

Qiang Wu, Yayi Wei, Tianchun Ye, 2018 .

Optimization of absorber and multilayer in EUV mask for 1D and 2D patterns

Yayi Wei, Jing Zhang, Jiang Yan, 2018, Photomask Technology.

Characteristic study of image-based alignment for increasing accuracy in lithography application

Libin Zhang, Yayi Wei, Lisong Dong, 2017 .

Co-optimization of the mask, process, and lithography-tool parameters to extend the process window

Lihui Liu, Yanqiu Li, Lisong Dong, 2014 .

New alignment mark design structures for higher diffraction order wafer quality enhancement

Libin Zhang, Yayi Wei, Lisong Dong, 2017, Advanced Lithography.

Impact of flare on source mask optimization in EUVL for 7nm technology node

Yayi Wei, Lisong Dong, Thuc Dam, 2020, Advanced Lithography.

Gradient-based resolution enhancement optimization methods based on vector imaging model

Yanqiu Li, Lisong Dong, Xu Ma, 2012, Advanced Lithography.

Optimization of the focus monitor mark in immersion lithography according to illumination type

Libin Zhang, Yayi Wei, Lisong Dong, 2017 .

Analysis and mitigation of forbidden pitch effects for EUV lithography

Yayi Wei, Lisong Dong, Xiaojing Su, 2020, Photomask Technology.

Analysis and modulation of aberration in an extreme ultraviolet lithography projector via rigorous simulation and a back propagation neural network.

Yayi Wei, Lisong Dong, Xiaojing Su, 2020, Applied optics.

Efficient source polarization optimization for robust optical lithography

Yanqiu Li, Lihui Liu, Chunying Han, 2014, Advanced Lithography.

A diffraction-based overlay model based on FDTD method

Yayi Wei, Ling Ma, Lisong Dong, 2019, Advanced Lithography.

Necessity of resist model in source mask optimization for negative tone development process

Yayi Wei, Lisong Dong, Qiang Wu, 2017 .

SoulNet: ultrafast optical source optimization utilizing generative neural networks for advanced lithography

Yayi Wei, David Z. Pan, Lisong Dong, 2019, Journal of Micro/Nanolithography, MEMS, and MOEMS.

Applications of RCWA on EUV mask optics

Yayi Wei, Lisong Dong, Taian Fan, 2017, Photomask Technology.

Parametric source-mask-numerical aperture co-optimization for immersion lithography

Yanqiu Li, Lihui Liu, Chunying Han, 2014 .

Design Driven Test Patterns for SMO OPC and SPA

Yayi Wei, Lisong Dong, Libin Zhang, 2019, 2019 China Semiconductor Technology International Conference (CSTIC).

Mask optimization approaches in optical lithography based on a vector imaging model.

Yanqiu Li, Lisong Dong, Xu Ma, 2012, Journal of the Optical Society of America. A, Optics, image science, and vision.

Optimization of resist parameters to improve the profile and process window of the contact pattern in advanced node

Libin Zhang, Yayi Wei, Lisong Dong, 2016 .

Measuring the polarization aberration of hyper-NA lens from the vector aerial image

Yanqiu Li, Lisong Dong, Hao Liu, 2014, Other Conferences.

Vectorial mask optimization methods for robust optical lithography

Yanqiu Li, Lisong Dong, Gonzalo R. Arce, 2012 .

A method for compensating lithographic influence of EUV mask blank defects by an advanced genetic algorithm

Yayi Wei, Lisong Dong, Tianchun Ye, 2019, Photomask Technology.

Hybrid source mask optimization for robust immersion lithography.

Yanqiu Li, Chunying Han, Lisong Dong, 2013, Applied optics.

Retargeting of forbidden-dense-alternate structures for lithography capability improvement in advanced nodes.

Yayi Wei, Lijun Zhao, Lisong Dong, 2018, Applied optics.

Improving the topography performance of ion implantation resist

Yayi Wei, Lisong Dong, Xiaojing Su, 2017, Advanced Lithography.

New alignment mark designs in single patterning and self-aligned double patterning

Libin Zhang, Yayi Wei, Lisong Dong, 2017 .

Vectorial resolution enhancement: better fidelity for immersion lithography

Yanqiu Li, Lisong Dong, Xu Ma, 2014 .

Learning-based compressive sensing method for EUV lithographic source optimization.

Yayi Wei, Lisong Dong, Tianchun Ye, 2019, Optics express.

Gradient-based joint source polarization mask optimization for optical lithography

Yanqiu Li, Chunying Han, Lisong Dong, 2015 .

A fast DFM-driven standard cell qualification approach for critical layers of 14nm technology node

Yayi Wei, Lisong Dong, Xiaojing Su, 2019, Photomask Technology.

An offline roughness evaluation software and its application in quantitative calculation of wiggling based on low frequency Power Spectral Density method

Yayi Wei, Yansong Liu, Lisong Dong, 2017, 2017 China Semiconductor Technology International Conference (CSTIC).

Optimized parameters selected on the basis of the development defect model

Yayi Wei, Ling Ma, Lisong Dong, 2018 .

Design rule exploration for width sensitive zone for metal layers in advanced nodes

Chunshan Du, Yayi Wei, Lisong Dong, 2019, Advanced Lithography.

Design rule optimization for via layers of multiple patterning solution at 7nm technology node

Yayi Wei, Lisong Dong, Libin Zhang, 2020, Photomask Technology.

Systematic DTCO flow for yield improvement at 14/12nm technology node

Chunshan Du, Yayi Wei, Lisong Dong, 2020 .

Robust resolution enhancement optimization methods to process variations based on vector imaging model

Yanqiu Li, Lisong Dong, Xu Ma, 2012, Advanced Lithography.

Measurement of lens aberration based on vector imaging theory

Yanqiu Li, Lisong Dong, Hao Liu, 2014 .

Probability prediction model for bridging defects induced by combined influences from lithography and etch variations

Yayi Wei, Lisong Dong, Libin Zhang, 2019, Journal of Micro/Nanolithography, MEMS, and MOEMS.

EUV Mask Near-Field Synthesis

Yayi Wei, Lisong Dong, Taian Fan, 2019, 2019 China Semiconductor Technology International Conference (CSTIC).

The method of optimizing mask parameter suitable for lithography process

Libin Zhang, Yayi Wei, Lisong Dong, 2018, Advanced Lithography.

Via optimization methodology for enhancing robustness of design at 14/12nm technology node

Chunshan Du, Yayi Wei, Lisong Dong, 2020 .

Fast extreme ultraviolet lithography mask near-field calculation method based on machine learning.

Yayi Wei, Lisong Dong, Xu Ma, 2020, Applied optics.

A fast and flexible library-based thick-mask near-field calculation method

Yanqiu Li, Lisong Dong, Xu Ma, 2015, Advanced Lithography.

Inverse pupil wavefront optimization for immersion lithography.

Yanqiu Li, Chunying Han, Lisong Dong, 2014, Applied optics.

Focus shift impacted by mask 3D and comparison between Att. PSM and OMOG

Yayi Wei, Lisong Dong, Xiaojing Su, 2015, Advanced Lithography.

Sample patterns extraction from layout automatically based on hierarchical cluster algorithm for lithography process optimization

Ying Chen, Yayi Wei, Lisong Dong, 2019, Advanced Lithography.

Hotspots fixing flow in NTD process by using DTCO methodology at 10nm metal 1 layer

Chunshan Du, Yayi Wei, Feng Shao, 2017, Advanced Lithography.

A novel mask structure for measuring the defocus of scanner

Yayi Wei, Lisong Dong, Xiaojing Su, 2016, SPIE Advanced Lithography.

Vector simulation of pinhole diffraction behavior for high numerical aperture converging incident beam at deep ultraviolet wavelength

Bo Liu, Lisong Dong, Meng Zheng, 2014, Other Conferences.

Compressive sensing method for EUV source optimization using different bases

Yayi Wei, Lisong Dong, Jiaxin Lin, 2020, Advanced Lithography.

Fast optical proximity correction method based on nonlinear compressive sensing.

Yanqiu Li, Zhiqiang Wang, Javier Garcia-Frias, 2018, Optics express.

Pixelated source and mask optimization for immersion lithography.

Yanqiu Li, Chunying Han, Lisong Dong, 2013, Journal of the Optical Society of America. A, Optics, image science, and vision.

Understanding and Mitigating Stress Memorization Technique of Induced Layout Dependencies for NMOS HKMG Device

Ping Li, Lisong Dong, Rui Chen, 2021, IEEE Journal of the Electron Devices Society.

Impact of mask topography and flare on process window of EUV lithography

Yayi Wei, Lisong Dong, Rongbo Zhao, 2019, Photomask Technology.

LDPE/carbon black conductive composites: Influence of radiation crosslinking on PTC and NTC properties

Lisong Dong, Hongfeng Xie, Li-song Dong, 2002 .