Justin Long

Low-k etching using CF3I, a path to overcome current BEOL integration issues

E. Eisenbraun, V. Omarjee, C. Dussarrat, 2011, 2011 IEEE/SEMI Advanced Semiconductor Manufacturing Conference.

A Combined Gas Cluster Ion Beam (GCIB) and Chemical-Mechanical Polish (CMP) Planarization Scheme for Tungsten Replacement Metal Gate (W-RMG)

Changhong Wu, Taher Kagalwala, W. Tseng, 2016 .