Andrzej Karawajczyk

Controlling CD variations in a massively parallel pattern generator

Jarek Z. Luberek, Allen M. Carroll, Torbjoern Sandstrom, 2002, SPIE Advanced Lithography.

Improved photomask accuracy with a high-productivity DUV laser pattern generator

Per Carlqvist, Anders Österberg, Per Askebjer, 2006, SPIE Photomask Technology.

Properties of a 248-nm DUV laser mask pattern generator for the 90-nm and 65-nm technology nodes

Johan Karlsson, Marie Jacobsson, Andrzej Karawajczyk, 2003, SPIE Photomask Technology.

Laser PG Performance for 100 nm Photomasks

Per Askebjer, Robert Eklund, Allen M. Carroll, 2002, Photomask Technology.

Pattern accuracy and throughput optimization for an SLM-based 248-nm DUV laser mask pattern generator

Angela Beyerl, Andrzej Karawajczyk, Mans Bjuggren, 2004, Photomask Japan.

Pattern generation with SLM imaging

Per Askebjer, Torbjoern Sandstrom, Andrzej Karawajczyk, 2002, SPIE Photomask Technology.