J. Cobb

Magnetic-field penetration depth in TI2Ba2CuO6+δ in the overdoped regime

Y. Kubo, Y. Shimakawa, T. Manako, 1993, Nature.

Current Status of EUV Photoresists

Jonathan L. Cobb, Robert L. Brainard, Charlotte A. Cutler, 2003 .

Reversible magnetization measurements of the anisotropic superconducting parameters of the infinite-layer electron-doped compound Sr0.90La0.10CuO2 apparent anisotropy crossover

John T. Markert, J. Markert, J. L. Cobb, 1994 .

Rigorous EUV mask simulator using 2D and 3D waveguide methods

Zhengrong Zhu, Kevin D. Lucas, Jonathan L. Cobb, 2003, SPIE Advanced Lithography.

The impact of mask topography on CD control

Jonathan L. Cobb, Bernard J. Roman, Vladimir Ivin, 2005, SPIE Advanced Lithography.

Extreme ultraviolet lithography mask patterning and printability studies with a Ta-based absorber

Jonathan L. Cobb, Scott Daniel Hector, William J. Dauksher, 1999 .