Katrina Rook

Interfacial quality of high-reflectivity Mo-Si multilayers for EUV mask blanks

Paul Turner, Narasimhan Srinivasan, Katrina Rook, 2019, Photomask Technology.

Process optimization for performance improvement in Mo/Si multilayers for EUV mask blanks

Narasimhan Srinivasan, Katrina Rook, Tania Henry, 2020, Photomask Technology.

Ion beam etching of new absorber materials for sub-5nm EUV masks

Katrina Rook, Vincent Ip, Sandeep Kohli, 2019, Advanced Lithography.

Ion beam etch for the patterning of advanced absorber materials for EUV masks

Katrina Rook, Vincent Ip, Meng Lee, 2019, Photomask Japan.

Ion beam processing for critical EUV photomask process steps: mask blank deposition and photomask absorber etch

Katrina Rook, Vincent Ip, Sandeep Kohli, 2018, Photomask Technology.

Comparison of deposition techniques for Mo/Si reflective multilayers for EUV mask blanks

Kenji Yamamoto, Katrina Rook, Antonio Checco, 2021, Photomask Technology.

Optimization of ion-beam-deposited Mo/Si multilayers for extreme ultraviolet masks

Kenji Yamamoto, Katrina Rook, Narasimhan Srinivasan, 2021 .